Kanbach, Mike

[["dc.bibliographiccitation.firstpage","135"],["dc.bibliographiccitation.journal","Microelectronic Engineering"],["dc.bibliographiccitation.lastpage","138"],["dc.bibliographiccitation.volume","164"],["dc.contributor.author","Hoffmann-Urlaub, Sarah"],["dc.contributor.author","Hoehne, Philipp"],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Salditt, Tim"],["dc.date.accessioned","2017-09-07T11:44:34Z"],["dc.date.available","2017-09-07T11:44:34Z"],["dc.date.issued","2016"],["dc.description.abstract","This paper reports on the fabrication of X-ray waveguides, manufactured by e-beam lithography, reactive ion etching and wafer bonding techniques. By combination of these processing steps, long empty (air) channels with cross-sections in the range of 10 to 100 nm are obtained, forming a guiding layer, surrounded by a solid state cladding. Aside from silicon, we present also waveguide channels fabricated in germanium and quartz. The improved fabrication protocols lead to significantly enhanced exit flux for imaging applications. Finally, we address not only straight channels, but a large variety of various geometries, as required for different applications. (C) 2016 Elsevier B.V. All rights reserved."],["dc.identifier.doi","10.1016/j.mee.2016.07.010"],["dc.identifier.gro","3141608"],["dc.identifier.isi","000384855900022"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/679"],["dc.notes.intern","WoS Import 2017-03-10 / Funder: Helmholtz Society [VH-VI-403]; DESY [P10]; ESRF [ID01, BM20]"],["dc.notes.status","final"],["dc.notes.submitter","PUB_WoS_Import"],["dc.relation.eissn","1873-5568"],["dc.relation.issn","0167-9317"],["dc.relation.orgunit","Institut für Röntgenphysik"],["dc.relation.workinggroup","RG Salditt (Structure of Biomolecular Assemblies and X-Ray Physics)"],["dc.subject.gro","x-ray optics"],["dc.title","Advances in fabrication of X-ray waveguides"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.subtype","original_ja"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.artnumber","214305"],["dc.bibliographiccitation.issue","21"],["dc.bibliographiccitation.journal","Journal of Applied Physics"],["dc.bibliographiccitation.volume","115"],["dc.contributor.author","Neubauer, Heike"],["dc.contributor.author","Hoffmann, S."],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Haber, J."],["dc.contributor.author","Kalbfleisch, Sebastian"],["dc.contributor.author","Krueger, S. P."],["dc.contributor.author","Salditt, Tim"],["dc.date.accessioned","2017-09-07T11:46:12Z"],["dc.date.available","2017-09-07T11:46:12Z"],["dc.date.issued","2014"],["dc.description.abstract","We report on the fabrication and characterization of hard x-ray waveguide channels manufactured by e-beam lithography, reactive ion etching and wafer bonding. The guiding layer consists of air or vacuum and the cladding material of silicon, which is favorable in view of minimizing absorption losses. The specifications for waveguide channels which have to be met in the hard x-ray range to achieve a suitable beam confinement in two orthogonal directions are extremely demanding. First, high aspect ratios up to 10(6) have to be achieved between lateral structure size and length of the guides. Second, the channels have to be deeply embedded in material to warrant the guiding of the desired modes while absorbing all other (radiative) modes in the cladding material. We give a detailed report on device fabrication with the respective protocols and parameter optimization, the inspection and the optical characterization. (C) 2014 Author(s)."],["dc.identifier.doi","10.1063/1.4881495"],["dc.identifier.gro","3142107"],["dc.identifier.isi","000337161600057"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/4622"],["dc.language.iso","en"],["dc.notes.intern","WoS Import 2017-03-10"],["dc.notes.status","final"],["dc.notes.submitter","PUB_WoS_Import"],["dc.relation.eissn","1089-7550"],["dc.relation.issn","0021-8979"],["dc.relation.orgunit","Institut für Röntgenphysik"],["dc.relation.workinggroup","RG Salditt (Structure of Biomolecular Assemblies and X-Ray Physics)"],["dc.rights","CC BY 3.0"],["dc.subject.gro","x-ray optics"],["dc.title","High aspect ratio x-ray waveguide channels fabricated by e-beam lithography and wafer bonding"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.subtype","original_ja"],["dc.type.version","published_version"],["dspace.entity.type","Publication"]]