Now showing 1 - 3 of 3
  • 2013Conference Paper
    [["dc.bibliographiccitation.artnumber","884802"],["dc.bibliographiccitation.volume","8848"],["dc.contributor.author","Osterhoff, Markus"],["dc.contributor.author","Bartels, Matthias"],["dc.contributor.author","Döring, Florian"],["dc.contributor.author","Eberl, Christian"],["dc.contributor.author","Hoinkes, Thomas"],["dc.contributor.author","Hoffmann-Urlaub, Sarah"],["dc.contributor.author","Liese, Tobias"],["dc.contributor.author","Radisch, Volker"],["dc.contributor.author","Rauschenbeutel, Arno"],["dc.contributor.author","Robisch, Anna Lena"],["dc.contributor.author","Ruhlandt, Aike"],["dc.contributor.author","Schlenkrich, Felix"],["dc.contributor.author","Salditt, Tim"],["dc.contributor.author","Krebs, Hans Ulrich"],["dc.contributor.editor","Goto, Shunji"],["dc.contributor.editor","Morawe, Christian"],["dc.contributor.editor","Khounsary, Ali"],["dc.date.accessioned","2020-02-24T13:39:51Z"],["dc.date.available","2020-02-24T13:39:51Z"],["dc.date.issued","2013"],["dc.description.abstract","We present experiments carried out using a combined hard x-ray focusing set-up preserving the benefits of a large-aperture Kirckpatrick-Baez (KB) mirror system and a small focal length multilayer zone plane (MZP). The high gain KB mirrors produce a pre-focus of 400 nm × 200 nm; in their defocus, two MZP lenses of diameter of 1.6 μm and 3.7 μm have been placed, with focal lengths of 50 μm and 250 μm respectively. The lenses have been produced using pulsed laser deposition (PLD) and focused ion beam (FIB). Forward simulations including error models based on measured deviations, auto-correlation analysis and three-plane phase reconstruction support two-dimensional focus sizes of 4.3 nm × 4.7 nm (7:9 keV, W/Si)1 and 4.3 nm ×5.9 nm (13:8 keV, W/ZrO2), respectively."],["dc.identifier.doi","10.1117/12.2025389"],["dc.identifier.gro","3145113"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/2814"],["dc.language.iso","en"],["dc.notes.intern","Crossref Import"],["dc.notes.status","final"],["dc.relation.conference","SPIE"],["dc.relation.crisseries","Proceedings of SPIE"],["dc.relation.eventend","2013-08-28"],["dc.relation.eventlocation","San Diego"],["dc.relation.eventstart","2013"],["dc.relation.isbn","978-0-8194-9698-0"],["dc.relation.ispartof","Advances in X-ray/EUV optics and components VIII"],["dc.relation.ispartofseries","Proceedings of SPIE; 8848"],["dc.relation.issn","0277-786X"],["dc.relation.orgunit","Institut für Röntgenphysik"],["dc.relation.workinggroup","RG Salditt (Structure of Biomolecular Assemblies and X-Ray Physics)"],["dc.subject.gro","x-ray optics"],["dc.title","Two-dimensional sub-5-nm hard x-ray focusing with MZP"],["dc.type","conference_paper"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","no"],["dspace.entity.type","Publication"]]
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  • 2015Conference Paper
    [["dc.bibliographiccitation.firstpage","958808"],["dc.bibliographiccitation.volume","9588"],["dc.contributor.author","Eberl, Christian"],["dc.contributor.author","Osterhoff, Markus"],["dc.contributor.author","Döring, Florian"],["dc.contributor.author","Krebs, Hans Ulrich"],["dc.contributor.editor","Goto, Shunji"],["dc.contributor.editor","Morawe, Christian"],["dc.contributor.editor","Khounsary, Ali M."],["dc.date.accessioned","2020-02-24T13:33:00Z"],["dc.date.available","2020-02-24T13:33:00Z"],["dc.date.issued","2015"],["dc.identifier.doi","10.1117/12.2187788"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/63008"],["dc.notes.preprint","yes"],["dc.relation","SFB 755: Nanoscale Photonic Imaging"],["dc.relation.conference","SPIE"],["dc.relation.eventlocation","San Diego"],["dc.relation.eventstart","2015"],["dc.relation.iserratumof","yes"],["dc.relation.issn","0277-786X"],["dc.subject.gro","x-ray optics and imaging"],["dc.title","MZP design and fabrication for efficient hard x-ray nano-focusing and imaging"],["dc.type","conference_paper"],["dc.type.internalPublication","yes"],["dspace.entity.type","Publication"]]
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  • 2017Conference Paper
    [["dc.bibliographiccitation.artnumber","1038608"],["dc.bibliographiccitation.firstpage","7"],["dc.contributor.author","Krebs, Hans-Ulrich"],["dc.contributor.author","Soltau, Jakob"],["dc.contributor.author","Eberl, Christian"],["dc.contributor.author","Osterhoff, Markus"],["dc.contributor.editor","Goto, Shunji"],["dc.contributor.editor","Khounsary, Ali M."],["dc.contributor.editor","Morawe, Christian"],["dc.date.accessioned","2020-01-31T12:33:22Z"],["dc.date.available","2020-01-31T12:33:22Z"],["dc.date.issued","2017"],["dc.description.abstract","Penetration lengths in the millimetre range make hard x-rays above 60 keV a well-suited tool for non-invasive probing of small specimens buried deep inside their surroundings, and enable studying individual components inside assembled, complex devices (solar cells, batteries etc.). The real-space resolution of typical imaging modalities like fluorescence mapping, scanning SAXS and WAXS depend on the available beam size. Although routine in the 5–25keV regime [1-4], spot sizes below 50nm are very challenging at x-ray energies above 50 keV: Compound refractive lenses lack in refractive power, the multilayer thickness of coated mirrors is bounded by interfacial diffusion, and lithographic Fresnel Zone Plates loose their efficiency in the two-digit keV regime. Multilayer Laue Lenses and Multilayer Zone Plates (MZP) are promising candidates for high-keV focusing to small spot sizes; compared to Fresnel Zone Plates, the aspect ratio comparing outermost layer width (~focal spot size) to optical thickness (efficiency) is virtually unlimited by the fabrication. Using Pulsed Laser Deposition on a rotating wire (several millimetre long), we have fabricated an MZP with 10nm outermost zone widths and optical thickness of 30 μm(optimum phase shift at 60 keV), yielding an unprecedented ultra-high aspect ratio of 1:3000 (outermost zone width compared to optical thickness). We present experimental results obtained at ESRF’s high energy beamline ID31, where for the first time scanning experiments with real-space resolutions below 50nm even at x-ray energies ranging from 60 keV to above 100 keV have been achieved."],["dc.identifier.doi","10.1117/12.2271139"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/62921"],["dc.language.iso","en"],["dc.relation","SFB 755: Nanoscale Photonic Imaging"],["dc.relation.conference","SPIE Optical Engineering + Applications, 2017,"],["dc.relation.eventend","2017"],["dc.relation.eventlocation","San Diego, California, United States"],["dc.relation.eventstart","2017"],["dc.relation.isbn","978-1-5106-1229-7"],["dc.relation.isbn","978-1-5106-1230-3"],["dc.relation.ispartof","Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII"],["dc.subject.gro","x-ray optics and imaging"],["dc.title","Ultra-high-aspect multilayer zone plates for even higher x-ray energies"],["dc.type","conference_paper"],["dc.type.internalPublication","yes"],["dspace.entity.type","Publication"]]
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