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Krebs, Hans Ulrich
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Krebs, Hans Ulrich
Official Name
Krebs, Hans Ulrich
Alternative Name
Krebs, Hans U.
Krebs, Hans
Krebs, H.
Krebs, Hans-Ulrich
Krebs, H.-U.
Krebs, H. U.
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2015Conference Paper [["dc.bibliographiccitation.firstpage","958808"],["dc.bibliographiccitation.volume","9588"],["dc.contributor.author","Eberl, Christian"],["dc.contributor.author","Osterhoff, Markus"],["dc.contributor.author","Döring, Florian"],["dc.contributor.author","Krebs, Hans Ulrich"],["dc.contributor.editor","Goto, Shunji"],["dc.contributor.editor","Morawe, Christian"],["dc.contributor.editor","Khounsary, Ali M."],["dc.date.accessioned","2020-02-24T13:33:00Z"],["dc.date.available","2020-02-24T13:33:00Z"],["dc.date.issued","2015"],["dc.identifier.doi","10.1117/12.2187788"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/63008"],["dc.notes.preprint","yes"],["dc.relation","SFB 755: Nanoscale Photonic Imaging"],["dc.relation.conference","SPIE"],["dc.relation.eventlocation","San Diego"],["dc.relation.eventstart","2015"],["dc.relation.iserratumof","yes"],["dc.relation.issn","0277-786X"],["dc.subject.gro","x-ray optics and imaging"],["dc.title","MZP design and fabrication for efficient hard x-ray nano-focusing and imaging"],["dc.type","conference_paper"],["dc.type.internalPublication","yes"],["dspace.entity.type","Publication"]]Details DOI2017Conference Paper [["dc.bibliographiccitation.artnumber","1038608"],["dc.bibliographiccitation.firstpage","7"],["dc.contributor.author","Krebs, Hans-Ulrich"],["dc.contributor.author","Soltau, Jakob"],["dc.contributor.author","Eberl, Christian"],["dc.contributor.author","Osterhoff, Markus"],["dc.contributor.editor","Goto, Shunji"],["dc.contributor.editor","Khounsary, Ali M."],["dc.contributor.editor","Morawe, Christian"],["dc.date.accessioned","2020-01-31T12:33:22Z"],["dc.date.available","2020-01-31T12:33:22Z"],["dc.date.issued","2017"],["dc.description.abstract","Penetration lengths in the millimetre range make hard x-rays above 60 keV a well-suited tool for non-invasive probing of small specimens buried deep inside their surroundings, and enable studying individual components inside assembled, complex devices (solar cells, batteries etc.). The real-space resolution of typical imaging modalities like fluorescence mapping, scanning SAXS and WAXS depend on the available beam size. Although routine in the 5–25keV regime [1-4], spot sizes below 50nm are very challenging at x-ray energies above 50 keV: Compound refractive lenses lack in refractive power, the multilayer thickness of coated mirrors is bounded by interfacial diffusion, and lithographic Fresnel Zone Plates loose their efficiency in the two-digit keV regime. Multilayer Laue Lenses and Multilayer Zone Plates (MZP) are promising candidates for high-keV focusing to small spot sizes; compared to Fresnel Zone Plates, the aspect ratio comparing outermost layer width (~focal spot size) to optical thickness (efficiency) is virtually unlimited by the fabrication. Using Pulsed Laser Deposition on a rotating wire (several millimetre long), we have fabricated an MZP with 10nm outermost zone widths and optical thickness of 30 μm(optimum phase shift at 60 keV), yielding an unprecedented ultra-high aspect ratio of 1:3000 (outermost zone width compared to optical thickness). We present experimental results obtained at ESRF’s high energy beamline ID31, where for the first time scanning experiments with real-space resolutions below 50nm even at x-ray energies ranging from 60 keV to above 100 keV have been achieved."],["dc.identifier.doi","10.1117/12.2271139"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/62921"],["dc.language.iso","en"],["dc.relation","SFB 755: Nanoscale Photonic Imaging"],["dc.relation.conference","SPIE Optical Engineering + Applications, 2017,"],["dc.relation.eventend","2017"],["dc.relation.eventlocation","San Diego, California, United States"],["dc.relation.eventstart","2017"],["dc.relation.isbn","978-1-5106-1229-7"],["dc.relation.isbn","978-1-5106-1230-3"],["dc.relation.ispartof","Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII"],["dc.subject.gro","x-ray optics and imaging"],["dc.title","Ultra-high-aspect multilayer zone plates for even higher x-ray energies"],["dc.type","conference_paper"],["dc.type.internalPublication","yes"],["dspace.entity.type","Publication"]]Details DOI