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Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry
ISSN
0031-9007
Date Issued
2006
Author(s)
Stoykovich, Mark P.
Park, S. M.
Papakonstantopoulos, Yioryos J.
de Pablo, Juan J.
Nealey, P. F.
Solak, Harun H.
DOI
10.1103/PhysRevLett.96.036104
Abstract
A study is presented of the self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates consisting of square arrays of spots, that preferentially attract one component, as a function of pattern dimensions and film thickness. The blend morphology follows the pattern at the substrate and forms a single quadratically perforated lamella (QPL). At intermediate film thicknesses necks connect this QPL to the film surface, resulting in a bicontinuous morphology. The necks do not register with the underlying square lattice but exhibit a substantial amount of hexagonal short-range order. For thicker films we observe bicontinuous morphologies consisting of parallel lamellae with disordered perforations. These results demonstrate a promising strategy for the fabrication of complex interfacial nanostructures from two-dimensional chemically patterned templates.