Kanbach, Mike

[["dc.bibliographiccitation.firstpage","135"],["dc.bibliographiccitation.journal","Microelectronic Engineering"],["dc.bibliographiccitation.lastpage","138"],["dc.bibliographiccitation.volume","164"],["dc.contributor.author","Hoffmann-Urlaub, Sarah"],["dc.contributor.author","Hoehne, Philipp"],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Salditt, Tim"],["dc.date.accessioned","2017-09-07T11:44:34Z"],["dc.date.available","2017-09-07T11:44:34Z"],["dc.date.issued","2016"],["dc.description.abstract","This paper reports on the fabrication of X-ray waveguides, manufactured by e-beam lithography, reactive ion etching and wafer bonding techniques. By combination of these processing steps, long empty (air) channels with cross-sections in the range of 10 to 100 nm are obtained, forming a guiding layer, surrounded by a solid state cladding. Aside from silicon, we present also waveguide channels fabricated in germanium and quartz. The improved fabrication protocols lead to significantly enhanced exit flux for imaging applications. Finally, we address not only straight channels, but a large variety of various geometries, as required for different applications. (C) 2016 Elsevier B.V. All rights reserved."],["dc.identifier.doi","10.1016/j.mee.2016.07.010"],["dc.identifier.gro","3141608"],["dc.identifier.isi","000384855900022"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/679"],["dc.notes.intern","WoS Import 2017-03-10 / Funder: Helmholtz Society [VH-VI-403]; DESY [P10]; ESRF [ID01, BM20]"],["dc.notes.status","final"],["dc.notes.submitter","PUB_WoS_Import"],["dc.relation.eissn","1873-5568"],["dc.relation.issn","0167-9317"],["dc.relation.orgunit","Institut für Röntgenphysik"],["dc.relation.workinggroup","RG Salditt (Structure of Biomolecular Assemblies and X-Ray Physics)"],["dc.subject.gro","x-ray optics"],["dc.title","Advances in fabrication of X-ray waveguides"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.subtype","original_ja"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.firstpage","61"],["dc.bibliographiccitation.journal","Ultramicroscopy"],["dc.bibliographiccitation.lastpage","70"],["dc.bibliographiccitation.volume","184"],["dc.contributor.author","Kramer, Thilo"],["dc.contributor.author","Mierwaldt, Daniel"],["dc.contributor.author","Scherff, Malte"],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Jooss, Christian"],["dc.date.accessioned","2020-12-10T15:21:40Z"],["dc.date.available","2020-12-10T15:21:40Z"],["dc.date.issued","2018"],["dc.identifier.doi","10.1016/j.ultramic.2017.08.012"],["dc.identifier.issn","0304-3991"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/73108"],["dc.language.iso","en"],["dc.notes.intern","DOI Import GROB-354"],["dc.relation.orgunit","Institut für Materialphysik"],["dc.title","Developing an in situ environmental TEM set up for investigations of resistive switching mechanisms in Pt-Pr1-xCaxMnO3-δ-Pt sandwich structures"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.subtype","original_ja"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.firstpage","885"],["dc.bibliographiccitation.issue","8"],["dc.bibliographiccitation.journal","American Journal of Science"],["dc.bibliographiccitation.lastpage","906"],["dc.bibliographiccitation.volume","312"],["dc.contributor.author","Fischer, Cornelius"],["dc.contributor.author","Michler, Alex"],["dc.contributor.author","Darbha, Gopala Krishna"],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Schaefer, Thorsten"],["dc.date.accessioned","2018-11-07T09:04:47Z"],["dc.date.available","2018-11-07T09:04:47Z"],["dc.date.issued","2012"],["dc.description.abstract","Deposition of colloids on mineral and rock surfaces is an important mechanism to alter surface reactivity and to govern contaminant migration. Particle retention in aquifers occurs predominantly under electrostatically unfavorable conditions owing to the prevailing negative charge of both mineral colloids and rock surfaces. Mineral and rock surfaces show often an irregular surface topography and roughness variations over several orders of magnitude. This complicates the colloid-surface attachment predictability and results in poor understanding towards retention efficiency. Here we study the impact of submicron-scale morphology on the interaction between rock surfaces and mineral colloids. Colloid retention experiments using micrite surfaces were performed under electrostatically unfavorable conditions. Results showed a positive and linear correlation between adsorbed particle density and surface roughness (RMS roughness <100 nm). The existence of a minimum roughness range, required for initial colloid deposition was detected. Deposition occurred mainly at micrite grain boundaries that acted as surface steps. Linear deposition kinetics was found at constant flow rates. The site-specific impact of surface roughness was studied using nanostructured silicon wafer surfaces as a well-defined analog material. Experimental results from deposition on such surfaces suggest that the surface step density on collector surfaces is a critical parameter for quantitative prediction of colloid deposition. The importance of colloidal retention is highlighted for the diagenetic evolution of rocks, especially due to inhibition mechanisms that has consequences for cement mineral distribution and concentration as well as resulting reservoir quality. For further quantitative prediction and modeling of retention on rock surfaces, we suggest the application of an energy potential function that includes beside DLVO contribution the impact of particle kinetic energy (via fluid-flow velocity) as well as the impact of reactive site density (via surface roughness parameter data)."],["dc.identifier.doi","10.2475/08.2012.02"],["dc.identifier.isi","000312679400002"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/25181"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Journal Science"],["dc.relation.issn","1945-452X"],["dc.relation.issn","0002-9599"],["dc.title","DEPOSITION OF MINERAL COLLOIDS ON ROUGH ROCK SURFACES"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.artnumber","214305"],["dc.bibliographiccitation.issue","21"],["dc.bibliographiccitation.journal","Journal of Applied Physics"],["dc.bibliographiccitation.volume","115"],["dc.contributor.author","Neubauer, Heike"],["dc.contributor.author","Hoffmann, S."],["dc.contributor.author","Kanbach, Mike"],["dc.contributor.author","Haber, J."],["dc.contributor.author","Kalbfleisch, Sebastian"],["dc.contributor.author","Krueger, S. P."],["dc.contributor.author","Salditt, Tim"],["dc.date.accessioned","2017-09-07T11:46:12Z"],["dc.date.available","2017-09-07T11:46:12Z"],["dc.date.issued","2014"],["dc.description.abstract","We report on the fabrication and characterization of hard x-ray waveguide channels manufactured by e-beam lithography, reactive ion etching and wafer bonding. The guiding layer consists of air or vacuum and the cladding material of silicon, which is favorable in view of minimizing absorption losses. The specifications for waveguide channels which have to be met in the hard x-ray range to achieve a suitable beam confinement in two orthogonal directions are extremely demanding. First, high aspect ratios up to 10(6) have to be achieved between lateral structure size and length of the guides. Second, the channels have to be deeply embedded in material to warrant the guiding of the desired modes while absorbing all other (radiative) modes in the cladding material. We give a detailed report on device fabrication with the respective protocols and parameter optimization, the inspection and the optical characterization. (C) 2014 Author(s)."],["dc.identifier.doi","10.1063/1.4881495"],["dc.identifier.gro","3142107"],["dc.identifier.isi","000337161600057"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/4622"],["dc.language.iso","en"],["dc.notes.intern","WoS Import 2017-03-10"],["dc.notes.status","final"],["dc.notes.submitter","PUB_WoS_Import"],["dc.relation.eissn","1089-7550"],["dc.relation.issn","0021-8979"],["dc.relation.orgunit","Institut für Röntgenphysik"],["dc.relation.workinggroup","RG Salditt (Structure of Biomolecular Assemblies and X-Ray Physics)"],["dc.rights","CC BY 3.0"],["dc.subject.gro","x-ray optics"],["dc.title","High aspect ratio x-ray waveguide channels fabricated by e-beam lithography and wafer bonding"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.subtype","original_ja"],["dc.type.version","published_version"],["dspace.entity.type","Publication"]]