Daoulas, Kostas Ch.

[["dc.bibliographiccitation.firstpage","168"],["dc.bibliographiccitation.issue","3"],["dc.bibliographiccitation.journal","ACS Nano"],["dc.bibliographiccitation.lastpage","175"],["dc.bibliographiccitation.volume","1"],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Kang, Huiman"],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Liu, Guoliang"],["dc.contributor.author","Liu, Chi-Chun"],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","Nealey, Paul F."],["dc.date.accessioned","2018-11-07T10:57:51Z"],["dc.date.available","2018-11-07T10:57:51Z"],["dc.date.issued","2007"],["dc.description.abstract","Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and density of features, and inexpensive processing. The insertion point of these materials in the production of integrated circuits, however, is often conceptualized in the short term for niche applications using the dense periodic arrays of spots or lines that characterize bulk block copolymer morphologies, or in the long term for device layouts completely redesigned into periodic arrays. Here we show that the domain structure of block copolymers in thin films can be directed to assemble into nearly the complete set of essential dense and isolated patterns as currently defined by the semiconductor industry. These results suggest that block copolymer materials, with their intrinsically advantageous self-assembling properties, may be amenable for broad application in advanced lithography, including device layouts used in existing nanomanufacturing processes."],["dc.identifier.doi","10.1021/nn700164p"],["dc.identifier.isi","000252145100006"],["dc.identifier.pmid","19206647"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/50347"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Chemical Soc"],["dc.relation.issn","1936-0851"],["dc.title","Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.firstpage","2334"],["dc.bibliographiccitation.issue","5"],["dc.bibliographiccitation.journal","Macromolecules"],["dc.bibliographiccitation.lastpage","2342"],["dc.bibliographiccitation.volume","43"],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","Kang, Huiman"],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Nealey, Paul F."],["dc.date.accessioned","2018-11-07T08:45:06Z"],["dc.date.available","2018-11-07T08:45:06Z"],["dc.date.issued","2010"],["dc.description.abstract","Block copolymer Structures have been directed to assemble oil chemically patterned surfaces with the domain interfaces oriented perpendicular to the substrate. Such methods have been pursued for lithographic applications to achieve long-range order in the assembled structures and, potentially more important, provide nanometer-level control over the interfaces between Structures. The chemically striped surfaces used for the directed assembly of lamellae are patterned by top-down lithographic techniques and thus often have rough edges between the regions of different chemistry. Here we quantitatively characterize, using experiments and molecular-level simulations, the propagation of line edge roughness from the chemically patterned surfaces into the interfaces between domains of block copolymer lamellae as a function of the wavelength, amplitude, and geometry of the roughness. Two geometries of surface pattern roughness are considered with oscillatory neighboring interfaces that are either in-phase or out-of-phase. Block copolymer lamellae of poly(styrene-b/ock-methyl methacrylate) effectively self-corrected surface patterns with small wavelength in-phase and out-of-phase roughness such that little or no memory of the Substrate pattern roughness could be observed at the top surface of a 40 nm thin film. Larger wavelength in-phase roughness, and to a lesser extent larger wavelength out-of-phase roughness, propagated farther from the surface pattern such that the domain interfaces between block copolymer lamellae maintained the roughness throughout the film. These self-healing capabilities of block copolymers will be essential for lithographic applications with tight tolerances on line edge roughness and line width control, e.g., in patterning transistor gates."],["dc.identifier.doi","10.1021/ma902494v"],["dc.identifier.isi","000274928400032"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/20353"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Chemical Soc"],["dc.relation.issn","0024-9297"],["dc.title","Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.firstpage","1284"],["dc.bibliographiccitation.issue","4"],["dc.bibliographiccitation.journal","Langmuir"],["dc.bibliographiccitation.lastpage","1295"],["dc.bibliographiccitation.volume","24"],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Kang, Huiman"],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Nealey, Paul F."],["dc.date.accessioned","2018-11-07T11:18:16Z"],["dc.date.available","2018-11-07T11:18:16Z"],["dc.date.issued","2008"],["dc.description.abstract","The directed assembly of lamella-forming copolymer systems on substrates chemically patterned with rough stripes has been studied using a Helfrich-type, phenomenological theory and Single-Chain-in-Mean-Field (SCMF) simulations. The stripe period matches that of the lamellar spacing in the bulk. The effect of the line edge roughness (LER) of the substrate pattern on the microphase-separated morphology was investigated considering two generic types of substrate LER with a single characteristic wavelength imposed on the edges of the stripes: undulation and peristaltic LER. In both cases, the domain interfaces are pinned to the rough stripe boundary at the substrate and, thus, are deformed. We study how this deformation decays as a function of the distance from the substrate. The simple theory and the SCMF simulations demonstrate that one of the basic factors determining the decay of the roughness transferred into the self-assembled morphology is the characteristic LER wavelength of the substrate pattern; i.e., the distance over which the roughness propagates away from the substrate increases with wavelength. However, both approaches reveal that, for a quantitative understanding of the consequences of substrate LER, it is important to consider the interplay of the pattern wavelength with the other characteristic length scales of the system, such as the film thickness and the bulk lamellar spacing. For instance, in thin films, the induced deformation of the lamellar interface decays slower with distance from the patterned surface than in thicker films. It is shown that the phenomenological theory can capture many of the same qualitative results as the SCMF simulations for copolymer assembly on substrate patterns with LER, but, at the same time, is limited by an incomplete description of the constraints on the polymer chain conformations imposed by the substrate."],["dc.identifier.doi","10.1021/la702482z"],["dc.identifier.isi","000253130900022"],["dc.identifier.pmid","18067336"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/54999"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Chemical Soc"],["dc.relation.issn","0743-7463"],["dc.title","Directed copolymer assembly on chemical substrate patterns: A phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate pattern"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.firstpage","2589"],["dc.bibliographiccitation.issue","18"],["dc.bibliographiccitation.journal","Journal of Polymer Science Part B Polymer Physics"],["dc.bibliographiccitation.lastpage","2604"],["dc.bibliographiccitation.volume","44"],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Papakonstantopoulos, Yioryos J."],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Nealey, Paul F."],["dc.contributor.author","Park, S. M."],["dc.contributor.author","Solak, Harun H."],["dc.date.accessioned","2018-11-07T09:15:27Z"],["dc.date.available","2018-11-07T09:15:27Z"],["dc.date.issued","2006"],["dc.description.abstract","The self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates is investigated by a concerted experimental and theoretical approach. The substrate pattern consists of square arrays of spots that preferentially attract one component of the blend. The mismatch between the lamellar equilibrium morphology of the copolymer material and the substrate pattern results in the formation of a bicontinuous morphology. At the substrate, a quadratically perforated lamella (QPL) assembles in perfect registry with the substrate pattern. From this, QPL necks emanate and reach the top surface of the film. The detailed structure of these cylindrical nanochannels is analyzed using Voronoi tessellation, orientation correlation functions, and the structure factor of the neck positions on the top surface. The surface morphology is dictated by the antagonism of the square symmetry of the substrate pattern and the tendency of the necks to locally pack in a hexagonal arrangement. The analogy and differences to a system of adsorbed monolayer on corrugated substrates is explored by comparing the arrangement of the necks on the film's top surface with the structure of a soft disk model on a quadratically corrugated substrate. (c) 2006 Wiley Periodicals, Inc."],["dc.identifier.doi","10.1002/polb.20904"],["dc.identifier.isi","000240300100008"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/27691"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","John Wiley & Sons Inc"],["dc.relation.issn","0887-6266"],["dc.title","Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.artnumber","036104"],["dc.bibliographiccitation.issue","3"],["dc.bibliographiccitation.journal","Physical Review Letters"],["dc.bibliographiccitation.volume","96"],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Mueller, M."],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Park, S. M."],["dc.contributor.author","Papakonstantopoulos, Yioryos J."],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Nealey, P. F."],["dc.contributor.author","Solak, Harun H."],["dc.date.accessioned","2018-11-07T10:25:40Z"],["dc.date.available","2018-11-07T10:25:40Z"],["dc.date.issued","2006"],["dc.description.abstract","A study is presented of the self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates consisting of square arrays of spots, that preferentially attract one component, as a function of pattern dimensions and film thickness. The blend morphology follows the pattern at the substrate and forms a single quadratically perforated lamella (QPL). At intermediate film thicknesses necks connect this QPL to the film surface, resulting in a bicontinuous morphology. The necks do not register with the underlying square lattice but exhibit a substantial amount of hexagonal short-range order. For thicker films we observe bicontinuous morphologies consisting of parallel lamellae with disordered perforations. These results demonstrate a promising strategy for the fabrication of complex interfacial nanostructures from two-dimensional chemically patterned templates."],["dc.identifier.doi","10.1103/PhysRevLett.96.036104"],["dc.identifier.isi","000234969300071"],["dc.identifier.pmid","16486737"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/42902"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","American Physical Soc"],["dc.relation.issn","0031-9007"],["dc.title","Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.artnumber","148303"],["dc.bibliographiccitation.issue","14"],["dc.bibliographiccitation.journal","Physical Review Letters"],["dc.bibliographiccitation.volume","100"],["dc.contributor.author","Kang, Huiman"],["dc.contributor.author","Detcheverry, Francois A."],["dc.contributor.author","Mangham, Andrew N."],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Hamers, Robert J."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","de Pablo, Juan J."],["dc.contributor.author","Nealey, Paul F."],["dc.date.accessioned","2018-11-07T11:16:06Z"],["dc.date.available","2018-11-07T11:16:06Z"],["dc.date.issued","2008"],["dc.description.abstract","We investigate the assembly of block copolymer-nanoparticle composite films on chemically nanopatterned substrates and present fully three-dimensional simulations of a coarse grain model for these hybrid systems. The location and distribution of nanoparticles within the ordered block copolymer domains depends on the thermodynamic state of the composite in equilibrium with the surface. Hierarchical assembly of nanoparticles enables applications in which the ability to precisely control their locations within periodic and nonregular geometry patterns and arrays is required."],["dc.identifier.doi","10.1103/PhysRevLett.100.148303"],["dc.identifier.isi","000254940900072"],["dc.identifier.pmid","18518077"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/54518"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Physical Soc"],["dc.relation.issn","0031-9007"],["dc.title","Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites"],["dc.type","journal_article"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]

[["dc.bibliographiccitation.journal","ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY"],["dc.bibliographiccitation.volume","233"],["dc.contributor.author","Detcheverry, Francois A."],["dc.contributor.author","Papakonstantopoulos, Yioryos J."],["dc.contributor.author","Daoulas, Kostas Ch."],["dc.contributor.author","Stoykovich, Mark P."],["dc.contributor.author","Nealey, Paul F."],["dc.contributor.author","Mueller, Marcus"],["dc.contributor.author","de Pablo, Juan J."],["dc.date.accessioned","2018-11-07T11:04:03Z"],["dc.date.available","2018-11-07T11:04:03Z"],["dc.date.issued","2007"],["dc.identifier.isi","000207723100141"],["dc.identifier.uri","https://resolver.sub.uni-goettingen.de/purl?gro-2/51749"],["dc.notes.status","zu prüfen"],["dc.notes.submitter","Najko"],["dc.publisher","Amer Chemical Soc"],["dc.publisher.place","Washington"],["dc.relation.conference","233rd National Meeting of the Cellulose-and-Renewable-Materials-Division of the American-Chemical-Society (ACS)"],["dc.relation.eventlocation","Chicago, IL"],["dc.relation.issn","0065-7727"],["dc.title","Driven self assembly of block copolymer nanocomposites on nanopatterned substrates for lithographic applications"],["dc.type","conference_abstract"],["dc.type.internalPublication","yes"],["dc.type.peerReviewed","yes"],["dc.type.status","published"],["dspace.entity.type","Publication"]]